NEEDS AND ADVANCES IN METROLOGY FOR PRECISION MOTION CONTROL IN MECHATRONICS

Robert J. Hocken, Mark L. Schattenburg

Abstract

Precision mechatronics are essential for the future manufacturing of nano devices and systems. Without accurate means to pattern, assemble, image and measure nano structures, we will be unable to meet the challenges of the next decade. In this paper we discuss the current state-of-theart in metrology used for motion control systems and make suggestions regarding possible future technologies that might improve the situation. What is required is a method to reduce the errors in stage position measurement which is currently interferometric on most production machines. The limitations of this technology are discussed as well as an alternative of using nano gratings to replace the interferometry.

Keywords

heterodyne, interferometry, lithography, nano grids, nanotechnology

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