REAL TIME EVALUATION OF VACUUM PROCESS FOR THIN FILM ALUMINUM DEPOSITION

Sang-Woo Kang, Ju-Young Yun, Jin-Tae Kim, Yong-Hyun Shin, Jong-Yeon Lim

Abstract

The chemical species in gas phase and on the surface of aluminum precursor (boro-hydride trimethylamine (ABHTMA)) for aluminum deposition process with the vacuum level and the hot wall temperature were studied using two kinds of Fourier transform infrared (FT-IR) spectroscopes which was installed at the end of the chamber. The absorbance of Al-H, B-H, C-H and C-N stretching features of the chemical species in the gas phase and on the surface was sensitive to the variation of analysis conditions. From those results, the temperature dependence of the film composition and quality could be explained.

Keywords

real time, vacuum process, CVD, FT-IR

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IMEKO-WC-2012-TC16-P3.pdf

DOI

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IMEKO TC

TC16 - Pressure and Vacuum Measurement

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