LASER FOCUSING OF CHROMIUM ATOMS

C. Yin, J. Qian, J. Wang, C. Shi

Abstract

Atom lithography can be used to fabricate regular nanoscale pattern on a substrate with high resolution and large area. Because the pitch of the grating is traceable to absolute atomic frequency, it has potential to be used as nanoscale pitch standards. The researches on laser focusing chromium in national institute of metrology are reported in this paper. Chromium wire array with a pitch of λ/2 and a height of 1 nm has been deposited on InP substrate.

Keywords

atom lithography, chromium, laser focusing, nanoscale pitch, calibration

Download

IMEKO-WC-2012-SS2-O2.pdf

DOI

-

Back to the proceedings