PRIMARY IMAGING INTERFERENCE MICROSCOPE FOR NANOMETROLOGY

I. Malinovsky, R. S. Franca, I. B. Couceiro, M. S. Lima, C. L. S. Azeredo, C. M. S. Almeida, J. P. Weid

Abstract

Here we report development of the primary nanometrology capacity at National Metrology Institute of Brazil (INMETRO). The interference microscope (IM) of Linnik type has been developed and it is currently under optimization and characterization. The registration of the fringes is done by automated CCD system with 2 possible processing approaches: interferometric pattern processing and the phase stepping technique. Some progress in development of the hardware and software adequate for subnanometer resolution of the instrument is reported. Some study of systematical errors of IM has been reported. The instrument is aimed for international key comparisons of step height standards.

Keywords

nanometrology, interference microscopy, AFM, gauge block, interferometry

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IMEKO-WC-2012-SS2-O5.pdf

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