LASER INTERFERENCE THERMOMETRY OF SOLIDS IN PLASMAS

A. N. Magunov

Abstract

Laser interferometric thermometry of semiconductor and dielectric plates is the most sensitive and reliable technique for measurements in plasma processing. This technique can be used within a wide range of experimental conditions, including roughness and thin films on the surface, non-parallelism of surfaces, almost any angle of light incidence. Some results on the temperature monitoring of silicon crystal heated in a plasma and on the end-point detection of exothermic plasma chemical reaction on the surface are presented.

Keywords

laser thermometry, plasma surface interaction

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IMEKO-WC-2000-TC12-P310.pdf

DOI

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IMEKO TC

TC12 - Temperature and Thermal Measurements

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