THE GROWTH OF THE OXIDE LAYER ON SILICON SPHERES AND ITS INFLUENCE ON THEIR MASS STABILITY
Abstract
The first results of gravimetric measurements of the growth of the oxide layer on single-crystal silicon spheres are presented and compared with a theoretical model and with measurements of the surface layer based on X-ray and ellipsometric methods. From the results, conclusions can be drawn about the quantitative influence of the growth of the oxide layer on the mass stability of silicon spheres.
Event details
- Event
- TC3 Conference 2014
- Linked User
- Dirk Röske
- Technical Committee
- TC3
- Place
- Cape Town, SOUTH AFRICA
- Time
- 3 February 2014 - 6 February 2014
- Website
- http://conferences.imeko.org/index.php/tc3-5-22/2014