DENSITY MEASUREMENT OF A THIN-FILM BY THE PRESSURE-OF-FLOTATION METHOD

Atsushi Waseda, Kenichi Fujii

Abstract

A method for density and thickness measurements of a thin-film is described by the pressure-offlotation method (PFM). The density and thickness of a silicon thermal oxide layer on silicon crystal are determined by measuring the density and mass differences for the sample with and without the thin-film. Details on the density and thickness measurement and the results of the measurements are presented.

Keywords

density, pressure-of-flotation, thin-film, molybdenum, silicon oxide

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PWC-2006-TC3-039u.pdf

DOI

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IMEKO TC

TC3 - Measurement of Force, Mass, Torque, and Gravity

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