ESTIMATION OF SYSTEMATIC ERROR OF NANOPROFILER USING NORMAL VECTOR TRACING METHOD

Ryota Kudo, Kenya Okita, Kohei Okuda, Yusuke Tokuta, Motohiro Nakano, Kazuya Yamamura, Katsuyoshi Endo

Abstract

We have developed a nanoprofiler using the normal vector. The aim is to measure the free-form or aspherical high-precision. Since this method does not use a reference surface, it may be possible to measure the free form with high accuracy. Reproducibility of sub nm has been achieved so far. With the aim of the reduction and the evaluation of uncertainty, the estimation of the systematic error is attempted. We investigated the effect of systematic error has on the measurement result by computer simulation. Comparing the experimental results with the results, systematic errors are estimated.

Keywords

nanoprofiler, normal vector, aspheric surface, high precision mirror

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IMEKO TC

TC14 - Measurement of Geometrical Quantities

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