FABRICATION AND CHARAKTERIZATION OF THIN FILM COAXIAL AC/DC RESISTORS FOR THE DETERMINATION OF <I>R</I><SUB>K</SUB>

A. Bounouh, F. Lapostolle, S. Lamy

Abstract

This paper describes the fabrication and charakterization of ultra thin films of NiCr deposited on cylindrical ac-dc resistance standards. The layers are obtained by magnetron sputtering technique and their structural charakterization are carried out by using Scanning Electron Microscopy (SEM), Energy Dispersive Spectroscopy (EDS) and Atomic Force Microscopy (AFM). A first set of resistance sticks has been obtained with a good homogeneity of thickness. The layer thickness varies from 8 nm to 70 nm and correspond to a wide range of resistance values, from 1 k&Omega; to 100 k&Omega;.

Keywords

impedance, AC measurements, calculable resistance, thin films

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PWC-2006-TC4-004u.pdf

DOI

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IMEKO TC

TC4 - Measurement of Electrical Quantities

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