IMPACT OF STOCHASTIC LINE EDGE ROUGHNESS PATTERNS ON SCATTEROMETRY

Hermann Gross, Sebastian Heidenreich, Markus Bär

Abstract

We present a fast non-rigorous method for the analysis of stochastic line edge roughness (LER) with amplitudes in the range of a few nanometers, based on a 2D Fourier transform method. LER has an significant impact on the light diffraction patterns measured by scatterometry. Scatterometry is a fast, non-destructive optical method used in wafer metrology to determine the geometry parameters of periodic surface structures from scattered light intensities.

Keywords

scatterometry, critical dimensions (CDs), line edge roughness (LER), Fourier optics

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IMEKO-WC-2015-TC21-393.pdf

DOI

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IMEKO TC

TC21 - Mathematical Tools for Measurements

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