Investigation of nano-SQUIDs with Dayem bridges by e-beam lithography and reaction ion etching
Abstract
Nano-SQUIDs are sensitive devices for quantum detection and precision measurements due to the ultra-low noise level. This paper reports the fabrication and characterization of nano-SQUIDs fabricated by e-beam lithography and reaction ion etching (RIE). The Nano-SQUIDs were comprised by two Dayem nanobridges and a loop based on the monolayer Nb film. The width of the nanobridges was 94 nm and the diameter of the loop was 20 µm. A measurement system based on a physical properties measurement system and source-meters. The voltage-bias current (<i>I</i><sub>bias</sub>-<i>V</i>) properties at different temperatures showed that the working range of the nano-squid was 8.3 K to 7.0 K. The voltage-modulation flux (<i>V</i>-<i>?</i>) were characterized at 8.2 K and the flux modulation depth was large to be 74.5% with the bias current 287 µA. The <i>I</i><sub>bias</sub>-<i>V</i> and <i>V</i>-<i>?</i> (<i>I</i><sub>coil</sub>) showed that the e-beam lithography and RIE process were suitable for fabrication of nano-SQUIDs.
Event details
- Event
- tc4-2019