MECHANICAL CHARACTERIZATION OF GLASS FRIT BONDED WAFERS

K. Vogel, D. Wuensch, S. Uhlig, J. Froemel, F. Naumann, M. Wiemer, T. Gessner
Abstract:
Wafer bonding is a key technology in the manufacturing of microelectronic and micromechanical systems on industrial scale. Especially glass frit bonding is often used for the encapsulation of MEMS devices on wafer level. To ensure the reliability of these bonds and to prevent critical failure of the systems, characteristic mechanical properties of the bonded interface are required. The fracture toughness and the shear strength are suitable values to characterize the bonding strength and can be determined by micro chevron and shear testing. They depend on the bonding parameters as well as the test speed. Due to the correlation between measured bonding strength and test speed a maximum test speed has to be identified to obtain reliable failure criteria regarding the fracture toughness and the shear strength.
Keywords:
glass frit bonding, stress intensity coefficient, fracture toughness, shear strength, influence of test speed
Download:
IMEKO-YSESM-2012-39.pdf
DOI:
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Event details
IMEKO TC:
TC15
Event name:
TC15 Youth Symposium 2012
Title:

11th Youth Symposium on Experimental Solid Mechanics (TC15)

Place:
Brasov, ROMANIA
Time:
30 May 2012 - 02 June 2012