MEASUREMENT OF MOLECULAR SUBMONOLAYERS |
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| U. Riss, W. Meyer |
- Abstract:
- This paper describes a measurement technique (submonolayer ellipsometry) that can be used for the measurement of very thin layers and submonolayers (monolayers that do not cover the whole surface of a substrate). Ellipsometry is a very old common known technique in form of Nullellipsometry, Rotating Polariser, Rotating Compensator and Rotating Analyser Ellipsometry for the measurement of thin films. But for the measurement of very thin films these techniques are not useful, because Rotating Analyser, Rotating Compensator, Rotating Polariser Ellipsometers are from theory and praxis not able to measure very thin films correctly and Nullellipsometers have drift problems of the compensator anisotropy and have a too long measurement time. In this paper we describe an ellipsometer that has not this disadvantages and can measure the thickness of a submonolayer with a precision of about 0.002 nm in 4 seconds. The potential of the instrument is shown by some measurement examples where the locking of organic nano-sized molecules to a surface or to other molecules is measured.
- Keywords:
- ellipsometer, monolayer, molecule
- Download:
- IMEKO-WC-2000-MNT-P487.pdf
- DOI:
- -
- Event details
- Event name:
- XVI IMEKO World Congress
- Title:
Measurement - Supports Science - Improves Technology - Protects Environment ... and Provides Employment - Now and in the Future
- Place:
- Vienna, AUSTRIA
- Time:
- 25 September 2000 - 28 September 2000