DETERMINING CALIBRATION PARAMETERS FOR A HARTMANN-SHACK WAVEFRONT SENSOR |
|---|
| Felipe Tayer Amaral, Luciana P. Salles, Davies William de Lima Monteiro |
- Abstract:
- Adaptive Optics has become an important technology to reduce the effect of wavefront distortions. It is used, for instance, to compensate the effects of atmospheric distortion in astronomical telescopes and to reduce the impact on the quality of the retinal image caused by optical aberrations inserted by the cornea and eye optical path. A wavefront sensor is an important part of an adaptive optical system and in the Hartmann-Shack method three parameters must be estimated prior to the wavefront estimationstep: the distance between the microlens array and the image sensor chip; and the pixel pitches in the X and Y directions in the Hartmogram image. This paper presents one method to estimate the actual distance between a microlens array and an image sensor; and another method to calculate pixel pitches, both based on image processing techniques and geometric analysis.
- Keywords:
- microlens array, wavefront sensor, Hartmann, Shack method, adaptive optics, calibration
- Download:
- IMEKO-TC4-2011-014.pdf
- DOI:
- -
- Event details
- IMEKO TC:
- TC4
- Event name:
- TC4 Symposium 2011
- Title:
XVIIIth IMEKO TC4 International Symposium on Measurement of Electrical Quantities (part of Metrologia2011, together with IX International Congress on Electrical Metrology - IX SEMETRO)
- Place:
- Natal, BRAZIL
- Time:
- 27 September 2011 - 30 September 2011