A THREE-LAYER AND TWO-STAGE PLATFORM FOR POSITIONING WITH NANOMETER RESOLUTION AND SUBMICROMETER ACCURACY |
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| Marta Torralba, José A. Yagüe-Fabra, José A. Albajez, |
- Abstract:
- As a result of the progress in the multidisciplinary nanotechnology field the demand for precision positioning systems has sensibly increased in the last years. In this line, a novel two-dimensional moving nano-platform (NanoPla) is being designed. The set requirements of the initial prototype are not only high positioning accuracy and resolution but also long working range (50 × 50 mm), increasing the number of potential applications.
The presented paper demonstrates an illustrative part of the complete state-of-art realized, justifying and concluding with an optimal positioning system. Different long range stages have been considered and classified depending on their structure, motion systemand relative motion between sample and probe. The final result is the definition of a three-layer and two-stage architecture to characterize surface topography of larger areas with an integrated Atomic Force Microscopy (AFM) system. In order to meet the requirements (nanometer resolution and submicrometer accuracy) several different precision engineering principles and finite elements method software have been used. - Keywords:
- nanopositioning metrology, 2D platform, atomic force microscopy, prototype design
- Download:
- IMEKO-TC14-2013-33.pdf
- DOI:
- -
- Event details
- IMEKO TC:
- TC14
- Event name:
- TC14 ISMQC 2013
- Title:
11th International Symposium on Measurement and Quality Control
- Place:
- Cracow and Kielce, POLAND
- Time:
- 11 September 2013 - 13 September 2013