DENSITY MEASUREMENT OF A THIN-FILM BY THE PRESSURE-OF-FLOTATION METHOD |
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Atsushi Waseda, Kenichi Fujii |
- Abstract:
- A method for density and thickness measurements of a thin-film is described by the pressure-offlotation method (PFM). The density and thickness of a silicon thermal oxide layer on silicon crystal are determined by measuring the density and mass differences for the sample with and without the thin-film. Details on the density and thickness measurement and the results of the measurements are presented.
- Keywords:
- density, pressure-of-flotation, thin-film, molybdenum, silicon oxide
- Download:
- PWC-2006-TC3-039u.pdf
- DOI:
- -
- Event details
- Event name:
- XVIII IMEKO World Congress
- Title:
Metrology for a Sustainable Development
- Place:
- Rio de Janeiro, BRAZIL
- Time:
- 17 September 2006 - 22 September 2006