DENSITY MEASUREMENT OF A THIN-FILM BY THE PRESSURE-OF-FLOTATION METHOD

Atsushi Waseda, Kenichi Fujii
Abstract:
A method for density and thickness measurements of a thin-film is described by the pressure-offlotation method (PFM). The density and thickness of a silicon thermal oxide layer on silicon crystal are determined by measuring the density and mass differences for the sample with and without the thin-film. Details on the density and thickness measurement and the results of the measurements are presented.
Keywords:
density, pressure-of-flotation, thin-film, molybdenum, silicon oxide
Download:
PWC-2006-TC3-039u.pdf
DOI:
-
Event details
Event name:
XVIII IMEKO World Congress
Title:

Metrology for a Sustainable Development

Place:
Rio de Janeiro, BRAZIL
Time:
17 September 2006 - 22 September 2006