DEVELOPMENT OF THERMAL DIFFUSIVITY STANDARD FOR THIN FILMS: REFERENCE THIN FILM AND MEASUREMENT METHOD |
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| Takashi Yagi |
- Abstract:
- The reference thin metal film to calibrate for the thermal diffusivity is being developed in NMIJ. Mo thin film with a nominal thickness of 400 nm is candidate for the reference film. To inspect the fabrication process of the reference material, test films were prepared and estimated in terms of scatter of the physical properties. Thermal diffusivity of those films were measured using the pulsed light heating thermoreflectance apparatus originally developed by NMIJ. The measured thermal diffusivity is 3.46 × 10-5 m² s-1 and the standard deviation is 0.05 × 10-5 m² s-1 (1.6%) for 8 films sampled from a total of 75 films. We plan to supply the reference thin films based on above mentioned technology in 2014FY.
- Keywords:
- thermal diffusivity, Mo, reference film
- Download:
- IMEKO-TC14-2014-78.pdf
- DOI:
- -
- Event details
- IMEKO TC:
- TC14
- Event name:
- TC14 LMPMI Symposium 2014
- Title:
11th Symposium on Laser Metrology for Precision Measurement and Inspection in Industry
- Place:
- Tsukuba, JAPAN
- Time:
- 03 September 2014 - 05 September 2014