IMPACT OF STOCHASTIC LINE EDGE ROUGHNESS PATTERNS ON SCATTEROMETRY |
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| Hermann Gross, Sebastian Heidenreich, Markus Bär |
- Abstract:
- We present a fast non-rigorous method for the analysis of stochastic line edge roughness (LER) with amplitudes in the range of a few nanometers, based on a 2D Fourier transform method. LER has an significant impact on the light diffraction patterns measured by scatterometry. Scatterometry is a fast, non-destructive optical method used in wafer metrology to determine the geometry parameters of periodic surface structures from scattered light intensities.
- Keywords:
- scatterometry, critical dimensions (CDs), line edge roughness (LER), Fourier optics
- Download:
- IMEKO-WC-2015-TC21-393.pdf
- DOI:
- -
- Event details
- Event name:
- XXI IMEKO World Congress
- Title:
Measurement in Research and Industry
- Place:
- Prague, CZECH REPUBLIC
- Time:
- 30 August 2015 - 04 September 2015