Indium tin oxide thin films prepared by dc magnetron sputtering for transparent heating

Jianhua Li, Xueshen Wang, Pingwei Lin, Xinhua Chen, Longfa Zhang, Shuo Liu
Abstract:
This paper reported a research on conducting tin-doped indium oxide (ITO) films fabricated by dc magnetron sputtering for transparent heating. ITO films with a thickness of 130 nm were deposited on BF33 glass substrates, followed by an annealing process in N 2 atmosphere for 2 h at 450 ?. The crystal structure, surface morphology, optical and electrical properties of ITO films were characterized. The predominant crystal face orientation was (222). The transmittance from 400 nm to 800 nm was 92.5%. The sheet resistance and resistivity increased, and the temperature coefficient of resistance (TCR) decreased with the larger oxygen flow rate. A low TCR and proper resistivity were the key factors for the application of conducting transparent heating.
Keywords:
ITO, dc sputter, transparent, conducting
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IMEKO-TC4-2019-006.pdf
DOI:
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