Yasuhiro Mizutani, Yoshiyuki Uehane, Tomohito Kuwagait, Yukitoshi Otani, Norihiro Umeda
DETECTION OF SUBWAVELENGTH STRUCTURE PROFILE BY DECOMPOSITION OF MUELLAR MATRIX
Recently, the surface profiles of subwavelength structure have been reduced in size in order to develop microfabrication techniques. In particular, feature sizes of a few tens of nanometres are common in the semiconductor industry. This study uses a Mueller matrix polarimeter, which is based on a scatterometry technique, to evaluate the surface profiles of subwavelength structure. In this technique, a profile of the structure is determined from the Mueller matrix which expresses all the polarization properties of the sample by experimental measurements and calculated values. Furthermore, the Mueller matrix is decomposed for more precise detection. In this paper, the experimental results after decomposition agree well with the values obtained by numerical analysis. We measured the characteristic of non-diagonal elements in the Mueller matrix by varying the incidence azimuth of the subwavelength structure.