On the basis of brief introduction of the West-East Pipeline Project (WEPP), this paper describes the integrated technical solutions of the natural gas fiscal measurements used in WEPP in detail, which include the metering process design, the selection of flow meters and the associated instruments, the initial calibration of the flow meters, and the construction of natural gas flow standard facilities with high pressure and large capacity. The ultrasonic meters and turbine meters are selected, and the skid-mounted complete metering system is provided in each fiscal measurement station. The field check meter has been installed in each skid, and field check method to be used is discussed. The initial calibration results for the ultrasonic meters and turbine meters are presented also. Finally, the gas flow standard facilities consisting of the primary standard, secondary standard, and working standard are briefly introduced, which is designed to carry out full flow range calibrations of flow meters sizing from 50 to 400 mm in diameters.

Flow meters delivering inaccurate data is an economical and costumer relation concern in most areas of application where flow meters are key components for billing. Solution to this have so far been improved standards and schemes to implement and maintain such standards for the life time of the flow meter.
In contradiction to quality standard comes the flow meter self-diagnostic solution. Here the flow meter it self is capable of diagnosing the magnitude of its own metering error. It can then issue an alarm or even better impose corrections thus reducing the metering accuracy to an acceptable level.
This paper will discuss strategies for obtaining self-diagnosis and show some resent on-going work going towards self-diagnosing or even self-correcting flow meters. Indicating that real intelligent flow meters is a possible future.

As ultrasonic meters have replaced traditional measurement technologies for the past ten years, the applications have become more demanding. One of the most challenging problems for designers to overcome has been the operation of these meters near large noise sources such as control valves, regulators and -to some extend- also flow conditioners. Being at the forefront of technology both manufacturers and users have taken their part of the problems, but have overcome most of them by sharing their experiences.
Now, after gaining more than ten years of operational experiences with thousands of ultrasonic meters installed under a wide range of operating conditions, the time is ripe for a standard sharing the experiences with all others working in the gas measurement industry.
In contrast to other standards in this area, this (draft) standard is a truly international standard. It is based on the experience and knowledge of expets from all over the world, experts originating from more than 20 different countries.
One of the critical goals was to make this standard open for improvements; something that is especially of importance for a technology where there is still a lot of ongoing research. In order to accomplish this, the standard is written by setting requirements for the performance of ultrasonic meters instead of making demands on the technology.
For a user, in the end what counts is the quality of the measurement under operating conditions and the assurance that the meter will maintain its accuracy. Assuring the quality in the field can only be reached by a chain of controlled actions starting at the manufacturing through calibration to the installation and practical use in the field. Therefore requirements have been set, not only for the meter performance at the calibration facility alone, but also for all the other parts involved, including the calibration facilities and the care after the installation in the field.
Following the standard practice, requirements have been set for
- The performance of the meter at the calibration lab
- The transfer of the quality of the calibration curve to the field
- The conditions during calibration as well as the quality of the lab
- The assurance of the quality of the measurement result in the field
- The operation under field conditions

The paper describes the backgrounds of the harmonized reference values for the cubic meter of Natural Gas which are in use in Germany and The Netherlands since November 1st 1999. The harmonization process has been finalized on May 4, 2004 due to the incorporation of the French BNM to the harmonized reference value. The outcome was named: "Harmonized European Natural Gas Cubic Meter" as realized by three independent National Metrology Institutes.
The prerequisites of the harmonization process, underlying procedures, results obtained so far and the mutual benefits will be pointed out as well as the economic consequences for the European market.

In recent years rapid advances in Nano Technology have provided a variety of nano products in different applications. One area of research is focused of the possible use of nano particles as a basic element of electronic devices. This paper is an attempt to look on nanotechnology for electronics as the revolutionary technology. For example nanotechnology for electronics is to be viewed as the technology that picks up where traditional MOSFET (Metal oxide semi conductor field effect transistor) scaling stops. SILICON – BASED integrated circuits have experienced phenomenal growth since the invention and demonstration of the earliest devices; the first bipolar transistor in 1948, the first planar integrated circuit in 1961and the first general purpose metal –oxide-semiconductor field-effect transistor (MOSFET) in 1964. Today the semiconductor industry has combined revenues of over 140 billion dollars. This rapid technological progress was first predicted in 1965by Gordon Moore in the now famous “Moor’s Law” which stated that integrated circuit density and performance would double every 18 months. These improvements would come from reduced transistor dimensions. Increased transistor counts, and increased operating frequencies. Silicon – based metal oxide –semiconductor (MOS) technology will eventually run into fundamental limits and not be able to provide the expected increases in density and performance. Hence a new technology, nano technology will dominate in Electronics in the near future. This paper deals about that.